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Glass in a Matrix?

IP

US8890140

Owner

OSRAM GmbH

Filing Date

February 25, 2011

Priority Date

February 26, 2010

Portfolio

Lighting - OSRAM

Intro

The method described is an almost universal bit-efficient video compressing approach that can be used in various coding applications. The main goal is to reconstruct images in high quality by using a universal image coder with easy bit-level access. The idea is to search for unsteady regions in the image and to approximate the stationary regions separately and combining both of them.

Claims

1. A radiation-emitting component comprising: a semiconductor chip comprising an active layer suitable for generating electromagnetic radiation and a ...
  1. A radiation-emitting component comprising: a semiconductor chip comprising an active layer suitable for generating electromagnetic radiation and a radiation exit face; and a conversion element comprising a matrix material and a luminescent material, wherein the matrix material comprises silver phospho-tellurite with at least 40 wt. % tellurium oxide and is free of lead, boron trioxide and germanium oxide, wherein the conversion element is arranged downstream of the radiation exit face of the semiconductor chip.
  2. The component according to claim 1, wherein the matrix material is free of boron trioxide.
  3. The component according to claim 1, wherein the matrix material is free of germanium oxide.
  4. The component according to claim 1, wherein the conversion element is arranged directly on the radiation exit face of the semiconductor chip.
  5. The component according to claim 1, wherein spacing is arranged between the conversion element and the radiation exit face of the semiconductor chip so that an interspace filled with air is formed between the conversion element and the semiconductor chip.
  6. The component according to claim 1, wherein the matrix material comprises at least 75 wt. % tellurium oxide.
  7. The component according to claim 1, wherein the matrix material comprises at least one additional element that increases the refractive index of the matrix material.
  8. The component according to claim 1, wherein the matrix material exhibits a refractive index of greater than 2.
  9. The component according to claim 1, further comprising an additional layer exhibiting radiation-absorbing properties, the additional layer arranged downstream of the conversion element.
  10. The component according to claim 1, wherein a softening temperature of the matrix material is less than or equal to 350° C.
  11. The component according to claim 1, wherein the conversion element or the matrix material takes the form of an adhesion layer.
  12. The component according to claim 1, wherein the conversion element assumes wafer form.
  13. The component according to claim 1, wherein the conversion element is formed by a potting compound in which the semiconductor chip is embedded.
  14. The component according to claim 1, wherein the conversion element takes the form of a beam-shaping element.
  15. The component according to claim 1, wherein an interlayer is arranged between the radiation exit face and the matrix material, the interlayer is between 1 nm and 100 nm thick, a refractive index of the interlayer is between that of the semiconductor chip and that of the matrix material.
  16. A method for producing a radiation-emitting component, the method comprising: providing a semiconductor chip that comprises an active layer suitable for generating electromagnetic radiation and a radiation exit face; and applying a conversion element onto the radiation exit face of the semiconductor chip, wherein the conversion element comprises a matrix material and a luminescent material, wherein the matrix material comprises silver phospho-tellurite with at least 40 wt. % tellurium oxide and is free of lead, boron trioxide and germanium oxide, wherein application of the conversion element involves applying the matrix material onto the radiation exit face of the semiconductor chip and then coating it with the luminescent material, and the luminescent material sinking into the matrix material, and wherein a sinking temperature during said sinking is between a softening temperature of the matrix material and a hemisphere temperature of the matrix material so that the matrix material has a viscosity η of 102 dPas*s≧η≧10−2 dPas*s.
  17. A method according to claim 16, wherein the application of the conversion element further involves applying the matrix material directly onto the radiation exit face of the semiconductor chip.
  18. A method according to claim 17, wherein the matrix material is deliberately coated non-uniformly with the luminescent material, such that a uniform emission pattern may be obtained.
  19. A method for producing a radiation-emitting component, the method comprising: providing a semiconductor chip that comprises an active layer suitable for generating electromagnetic radiation and a radiation exit face; and applying a conversion element onto the radiation exit face of the semiconductor chip, wherein the conversion element comprises a matrix material and a luminescent material, wherein the matrix material comprises silver phospho-tellurite with at least 40 wt. % tellurium oxide and is free of lead, boron trioxide and germanium oxide.
  20. The method of claim 19, wherein the application of the conversion element involves applying the matrix material onto the radiation exit face of the semiconductor chip and then coating the matrix material with the luminescent material.  
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Abstract

A radiation-emitting component includes a semiconductor chip and a conversion element. The semiconductor chip includes an active layer suitable for ge...
A radiation-emitting component includes a semiconductor chip and a conversion element. The semiconductor chip includes an active layer suitable for generating electromagnetic radiation and a radiation exit face. The conversion element includes a matrix material and a luminescent material. The conversion element is arranged downstream of the radiation exit face of the semiconductor chip. The matrix material comprises at least 40 wt. % tellurium oxide and is free of boron trioxide and/or germanium oxide. A method for producing such a radiation-emitting component is furthermore stated.
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